Microwave Plasma Assisted Chemical Vapor Deposition System

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Description

MWCVD is designed for the production of diamond and nanocarbon layers with various structures: NCD (nanocrystalline), MCD (microcrystalline), with various nanoarchitecture, as well as coatings on geometrically complex 3D elements, microstructural and edge parts, doped or undoped diamond, graphene, carbon nanotubes and other hybrid carbon coatings (nano-walls, foams, nano-needles, etc.).\nThe MWCVF system is designed for the simplified and inexpensive deposition of carbon layers, It offers several built-in and custom features that enable users to start depositing high-quality layers within hours of installation.

Examples of research articles:
Publications

10.1016/j.diamond.2013.08.004; 10.1016/j.jhazmat.2020.123606; 10.1039/C4NR04417G

Details

Type of infrastructure:
'Core Lab' laboratory
Strategic infrastructure:
No
Accessibility
scientific research
commercial activities

Manager / operator

Manager

Manager's name
dr hab. inż. Robert Bogdanowicz
Manager's e-mail
robbogda@pg.edu.pl

Operator

Operator's name
dr inż. Michał Sobaszek
Operator's e-mail
micsobas@pg.edu.pl

Manufacturer

Manufacturer
SEKI
Year of production
2009

Laboratory where the equipment is located

Name of the laboratory
Laboratory of Innovative Materials and Elements

Location

University
Gdańsk University of Technology

Access rules

Access rules

The rules of using the equipment will be consistent with the research infrastructure management system being developed. The elements of this system include the method of reporting the demand for the performance of tests, the appointment of a person responsible for the performance of the tests, and the rules governing the intellectual property of the results. An element of the system will also be the settlement for the performed tests, allowing for free testing (in the case of joint publication or on the basis of reciprocity using the apparatus).