Microwave Plasma Assisted Chemical Vapor Deposition System
MWCVD is designed for the production of diamond and nanocarbon layers with various structures: NCD (nanocrystalline), MCD (microcrystalline), with various nanoarchitecture, as well as coatings on geometrically complex 3D elements, microstructural and edge parts, doped or undoped diamond, graphene, carbon nanotubes and other hybrid carbon coatings (nano-walls, foams, nano-needles, etc.).\nThe MWCVF system is designed for the simplified and inexpensive deposition of carbon layers, It offers several built-in and custom features that enable users to start depositing high-quality layers within h